Characterization of the implantation damage in SiO2 with x-ray photoelectron spectroscopy

Ajioka, Tsuneo; Ushio, Shintaro
May 1986
Applied Physics Letters;5/19/1986, Vol. 48 Issue 20, p1398
Academic Journal
X-ray photoelectron spectroscopy (XPS) has been applied to characterize the damage introduced into SiO2 by ion implantation. By measuring the peak width of Si2p from SiO2 which corresponds to perturbation of the SiO2 network, good depth profiles of the damage have been obtained for implanted samples and subsequently annealed samples. The results show that the damage distributed more widely than that calculated from energy deposition and that the perturbation of the network is caused not only by radiation damage but also by the existence of impurities in the network. It has been found that the XPS method is effective to understand the atomic structure, and thus, electrical properties of SiO2.


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