Pulsed CO2 laser etching of polyimide

Brannon, J. H.; Lankard, J. R.
May 1986
Applied Physics Letters;5/5/1986, Vol. 48 Issue 18, p1226
Academic Journal
Etching of thin polyimide films in air was investigated using a line tunable, pulsed CO2 laser. The threshold fluence for etching at a wavelength of 944 cm-1 (10.6 μm) exceeds that at 1087 cm-1 (9.2 μm) by a factor of 4. This is consistent with the infrared absorption spectrum which shows polyimide to be significantly more absorbing at 1087 cm-1. As a result, etching at 1087 cm-1 produces a cleaner, more precisely defined region. Analysis of the vapors generated during laser etching shows the simple gases CO2, H2O, and CO to be present.


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