Nanometer molecular lithography

Douglas, Kenneth; Clark, Noel A.; Rothschild, Kenneth J.
March 1986
Applied Physics Letters;3/10/1986, Vol. 48 Issue 10, p676
Academic Journal
We demonstrate a three-step parallel process for the fabrication of a 1-nm-thick metal (Ta/W) film with 15-nm-diam holes periodically arranged on a triangular lattice of parameter 22 nm. In this process, a two-dimensional crystalline protein monolayer is deposited on a smooth substrate, metal coated by evaporation, and then ion milled. Under ion milling this protein-metal heterostructure exhibits differential metal removal and rearrangement which varies on a protein molecular length scale. The spatial ordering of the resulting holes has the same nanometer periodicity as the protein lattice.


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