Morphology of hydrogenated amorphous silicon films by photochemical vapor deposition

Mutsukura, Nobuki; Machi, Yoshio
February 1986
Applied Physics Letters;2/24/1986, Vol. 48 Issue 8, p544
Academic Journal
The microstructure of hydrogenated amorphous silicon films deposited by the photochemical vapor deposition method was investigated using transmission electron microscopy. The circular structures on the top surface of the amorphous silicon film corresponded to both columnar crystalline structures and the amorphous-microcrystalline mixed structures. The growth of a single crystalline grain as large as 0.3 μm at a mere 150 °C through the photochemical vapor deposition process was also demonstrated.


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