Microcrystalline to amorphous transition in silicon from microwave plasmas

Schellenberg, J. J.; McLeod, R. D.; Mejia, S. R.; Card, H. C.; Kao, K. C.
January 1986
Applied Physics Letters;1/13/1986, Vol. 48 Issue 2, p163
Academic Journal
An experimental study has been made of Si:H thin films prepared by microwave plasma deposition, in which conditions of electron cyclotron resonance can be obtained in the plasma due to an externally applied axial dc magnetic field B. It is observed that as B is increased through resonance, the structure of the deposited films changes from microcyrstalline to amorphous.


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