TITLE

Reduction of electromigration in gold thin films in the presence of hydrogen

AUTHOR(S)
Rodbell, K. P.; Ficalora, P. J.
PUB. DATE
November 1985
SOURCE
Applied Physics Letters;11/1/1985, Vol. 47 Issue 9, p1010
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Electromigration lifetime experiments have been completed on Au thin-film interconnects (Au, 0.5 μm thick and 25 μm wide) in vacuum (5×10-8 Torr) and in both hydrogen (H2) and helium (He) ambients (10 Torr). Results show that electromigration is drastically suppressed in the H2 environment with a greater than tenfold increase in lifetime realized.
ACCESSION #
9818394

 

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