Early formation of chemical vapor deposition diamond films

Iijima, Sumio; Aikawa, Yumi; Baba, Kazuhiro
December 1990
Applied Physics Letters;12/17/1990, Vol. 57 Issue 25, p2646
Academic Journal
Nanometer-size diamond particles formed on a silicon substrate by the hot-filament chemical vapor deposition method were examined by a high-resolution electron microscope. The particles developed well-faceted cuboctahedral habits. Examination of their morphologies and microstructures provides a wealth of information on their crystal growth mechanism. The effect of the pretreatment of the substrate by diamond powder, which has been known to enhance thin-film growth, was found to be due to seeding by ‘‘diamond dust’’ on the substrate surface.


Related Articles

  • Preparation of textured diamond films on Si substrates by hot-filament chemical-vapor deposition. Ikoma, Keiko; Yamanaka, Mitsugu // Journal of Applied Physics;9/1/1993, Vol. 74 Issue 5, p3519 

    Presents information on a study which deposited diamond on silicon(111) substrates by a two-step hot-filament chemical vapor deposition method consisting of the pretreatment and growth processes. Experimental procedure; Characterization of the products by scanning electron microscopy; Formation...

  • Nucleation of diamond during hot filament chemical vapor deposition. Singh, Jogender; Vellaikal, M. // Journal of Applied Physics;3/15/1993, Vol. 73 Issue 6, p2831 

    Presents a study that investigated the mechanism of nucleation of diamond during hot filament chemical vapor deposition (HFCVD) process by high resolution transmission electron microscopy. Nucleation and growth characteristics of crystalline diamond; Details on the steps involved during the...

  • EFFECT OF CATALYST LAYER THICKNESS ON GROWTH OF CVD DIAMOND. Shahsavari, Fatemeh; Ghoranneviss, Mahmood; Khalaj, Zahra; Diudea, Mircea V. // Studia Universitatis Babes-Bolyai, Chemia;2011, Vol. 56 Issue 2, p141 

    Tungsten Nanocrystalline Diamond (NCD) films were grown on silicon substrates by Hot Filament Chemical Vapor Deposition (HFCVD) method using three different catalyst layer thicknesses. At first, the silicon substrates are ultrasonically cleaned in acetone; ethanol and demonized water for 15...

  • Fabrication of periodically ordered diamond nanostructures by microsphere lithography. Domonkos, Maria; Izak, Tibor; Stolcova, Lucie; Proska, Jan; Kromka, Alexander // Physica Status Solidi (B);Dec2014, Vol. 251 Issue 12, p2587 

    Structured diamond films are required for several uses as photonic crystals, (bio-) sensors, biomedicine, etc. Often, these uses require fabrication of nano-sized features with the assistance of lithographic techniques. In this paper, we demonstrate the growth of diamond structures well ordered...

  • Bias-enhanced nucleation of diamond during microwave-assisted chemical vapor deposition. Sheldon, Brian W.; Csencsits, Roseann; Rankin, Janet; Boekenhauer, Rachel E.; Shigesato, Yuzo // Journal of Applied Physics;5/15/1994, Vol. 75 Issue 10, p5001 

    Presents a study which investigated a bias-enhanced chemical vapor deposition of diamond, using cross-sectional transmission electron microscopy and concurrent electron energy-loss spectroscopy to characterize the deposited material. Description of experiments; Growth rate of the thin amorphous...

  • Direct-current bias effect on the synthesis of (001) textured diamond films on silicon. Lee, J.S.; Liu, K.S. // Applied Physics Letters;9/11/1995, Vol. 67 Issue 11, p1555 

    Investigates the necessary conditions involved in the synthesis of textured diamond films on silicon. Utilization of chemical vapor deposition in the growth of diamond films; Impact of modified bias voltage on diamond film growth; Alteration of the texture characteristics; Use of scanning...

  • Microstructure of ultrananocrystalline diamond films grown by microwave Ar-CH[sub 4] plasma chemical vapor deposition with or without added H[sub 2]. Jiao, S.; Sumant, A.; Kirk, M. A.; Gruen, D. M.; Krauss, A. R.; Auciello, O. // Journal of Applied Physics;7/1/2001, Vol. 90 Issue 1, p118 

    Ultrananocrystalline diamond (UNCD) films, grown using microwave plasma-enhanced chemical vapor deposition with gas mixtures of Ar-1%CH[sub 4] or Ar-1%CH[sub 4]-5%H[sub 2], have been examined with transmission electron microscopy (TEM). The films consist of equiaxed nanograins (2-10 nm in...

  • Experimental investigation and computational modeling of hot filament diamond chemical vapor... Zumbach, Volker; Schafer, Jorg; Tobai, Jens; Ridder, Michael; Dreier, Thomas; Schaich, Thomas; Wolfrum, Jurgen; Ruf, Bernhard; Behrendt, Frank; Deutschman, Olaf; Warnatz, Jurgen // Journal of Chemical Physics;10/15/1997, Vol. 107 Issue 15, p5918 

    Reports on experimental investigation and computational modeling of hot filament diamond chemical vapor deposition. Methods used to determine absolute concentrations of stable hydrocarbons and radicals; Varying filament and substrate temperatures; Concentration of vibrationally excited hydrogen.

  • Measurement of C[sub 6]H[sub 6] densities in a diamond deposition system. Goyette, A.N.; Anderson, L.W.; Peck, J.R.; Lawler, J.E. // Journal of Chemical Physics;3/1/1999, Vol. 110 Issue 9, p4647 

    Discusses the absolute column densities of gas phase C[sub 6]H[sub 6] and upper limits on absolute C[sub 4]H[sub 2] and C[sub 2]H[sub 3] concentrations in a hot filament diamond chemical vapor deposition reactor. Monitoring of the steady state density of C[sub 6]H[sub 6] as a function of C[sub...


Read the Article


Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics