TITLE

Sliding life enhancement of a WS2 sputtered film by ion beam mixing

AUTHOR(S)
Hirano, Motohisa; Miyake, Shojiro
PUB. DATE
October 1985
SOURCE
Applied Physics Letters;10/1/1985, Vol. 47 Issue 7, p683
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
The ion beam mixing effect on the tribological properties of the WS2 sputtered film is investigated. The film morphology and crystal structure related to the tribological properties are also examined. It is determined that a film so prepared has both lower friction and longer sliding life than an as-sputtered WS2 film. Scanning electron micrograph and reflection high-energy electron diffraction examinations suggest that the ion beam mixing effect can be attributed to crystalline precipitate formation resulting from recrystallization caused by the implantation.
ACCESSION #
9818204

 

Related Articles

  • Surface order and stoichiometry of sputter-cleaned and annealed CuInSe2. Corvini, P.; Kahn, A.; Wagner, S. // Journal of Applied Physics;4/15/1985, Vol. 57 Issue 8, p2967 

    Presents a study that investigated the applicability of argon ion bombardment followed by annealing with Auger electron spectroscopy and low-energy electron diffraction (LEED). LEED pattern from the surface after sputtering and annealing; Diagram of the top view of the chalcopyrite metal face...

  • Radiation damage in zircon by high-energy electron beams. Jiang, Nan; Spence, John C. H. // Journal of Applied Physics;Jun2009, Vol. 105 Issue 12, p123517-1 

    Radiation damage induced by high-energy (200 keV) electron irradiation in zircon has been studied thoroughly using imaging, diffraction, and electron energy-loss spectroscopy techniques in transmission electron microscopy. Both structural and compositional changes during the damage were measured...

  • Simultaneous formation of surface ripples and metallic nanodots induced by phase decomposition and focused ion beam patterning. Jie Lian; Wei Zhou; Wei, Q. M.; Wang, L. M.; Boatner, L. A.; Ewing, Rodney C. // Applied Physics Letters;2/27/2006, Vol. 88 Issue 9, p093112 

    We report the simultaneous formation of self-assembled surface ripples in Cd2Nb2O7 pyrochlore caused by focused ion beam (FIB) patterning and uniformly distributed metallic nanodots induced by phase decomposition under ion bombardment. The characteristic wavelength of the surface ripples is...

  • Sputtering of A[sup 3]B[sup 5] Materials (GaP, GaAs, GaSb, InP, and InSb) by 2- to 14-keV N[sup +][sub 2] Ions. Soshnikov, I. P.; Bert, N. A. // Technical Physics;Sep2000, Vol. 45 Issue 9, p1201 

    Investigations of the general characteristics and distinctive features of sputtering ofA[sup 3]B[sup 5] materials (GAP, GaAs, GaSb, InP and InSb) under bombardment with N[sup +, sub 2] ions have been carried out. From the experi- mental data, dependences of the sputtering yield of these...

  • Effect of surface roughness on the secondary ion yield in ion sputtering. Makeev, Maxim A.; Baraba´si, Albert-La´szlo´ // Applied Physics Letters;10/12/1998, Vol. 73 Issue 15 

    There is extensive experimental evidence that, at low temperatures, surface erosion by ion bombardment roughens the sputtered substrate, leading to a self-affine surface. These changes in the surface morphology also modify the secondary ion yield. Here, we calculate analytically the secondary...

  • Ion-Beam Modification of Track Membrane Surface. Pronin, V. A.; Gornov, V. N.; Lipin, A. V.; Loboda, P. A.; Mchedlishvili, B. V.; Nechaev, A. N.; Sergeev, A. V. // Technical Physics;Nov2001, Vol. 46 Issue 11, p1444 

    An ion-beam method to modify the track membrane surface is suggested. An ion gun based on a magnetron sputterer is developed. This gun provides ion energies in the range of 5 eV-1 keV, ion current density up to 0.8 mA/cm², and an ion beam aperture of 90 mm. After the track membrane surface...

  • Sputtering Characteristics of Fullerene C[sub 60] Films under Bombardment with 0.1–1-keV Argon Ions and Atoms. Soshnikov, I. P.; Lunev, A. V.; Gaevskiı, M. É.; Rotkina, L. G.; Barchenko, V. T. // Technical Physics;Jun2000, Vol. 45 Issue 6, p766 

    The sputtering of fullerene C[sub 60] films under bombardment with Ar[sup +] ions was studied. In thin films, blistering effects related to diffusion of the implanted argon ions along the layer and substrate interface have been found to occur. A threshold behavior was observed for sputtering at...

  • Sputtering and thermal effect during ion microbeam patterning of polymeric films. Ektessabi, A. M.; Sano, T. // Review of Scientific Instruments;Feb2000, Vol. 71 Issue 2, p1012 

    Investigates the machinability of polymers and the main parameters involved during ion microbeam processing of polymers. Simulation of basic physical phenomena during microion beam processing; Collisional and sputtering effects; Thermal effect and heat distribution.

  • Nanoscale effects in focused ion beam processing. Frey, L.; Lehrer, C.; Ryssel, H. // Applied Physics A: Materials Science & Processing;2003, Vol. 76 Issue 7, p1017 

    Focused ion beams with diameters of 8 to 50 nm are used for material processing in the nanoscale regime. In this paper, effects of the ion beam–solid interaction determining the formation of small structures by ion-beam sputtering and chemically assisted material deposition and etching...

Share

Read the Article

Courtesy of THE LIBRARY OF VIRGINIA

Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics