TITLE

Photoenhanced electron attachment of vinylchloride and trifluoroethylene at 193 nm

AUTHOR(S)
Rossi, M. J.; Helm, H.; Lorents, D. C.
PUB. DATE
September 1985
SOURCE
Applied Physics Letters;9/15/1985, Vol. 47 Issue 6, p576
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
We show that the electron attachment properties of a gas mixture of helium containing vinylchloride or trifluoroethylene can be altered from nonattaching to strongly attaching by irradiation with a low-energy laser pulse at 193 nm. These molecules are photodissociated producing vibrationally excited HCl or HF and other fragments that strongly attach low-energy electrons.
ACCESSION #
9818176

 

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