TITLE

Thermal and plasma wave depth profiling in silicon

AUTHOR(S)
Opsal, Jon; Rosencwaig, Allan
PUB. DATE
September 1985
SOURCE
Applied Physics Letters;9/1/1985, Vol. 47 Issue 5, p498
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
We describe a depth-profiling concept using the critically damped plasma wave corresponding to the propagation of the free-carrier plasma density generated by a modulated laser in a semiconductor.
ACCESSION #
9818053

 

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