TITLE

Low loss optical waveguides fabricated by thermal nitridation of oxidized silicon

AUTHOR(S)
Zelmon, David E.; Boyd, Joseph T.; Jackson, Howard E.
PUB. DATE
August 1985
SOURCE
Applied Physics Letters;8/15/1985, Vol. 47 Issue 4, p353
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
This letter describes the first optical waveguides fabricated by thermal nitridation of SiO[sub 2]. This process has allowed us to create layers of silicon oxynitride of about 100-nm thickness in 4.8-µmthick silicon dioxide layers by exposing thermally oxidized silicon wafers to an ammonia atmosphere for times ranging from one to ten days. Ellipsometric measurements show that the refractive indices of the nitrided layers range from 1.67 to 1.75. Losses for nine optical waveguide samples fabricated with this process range from 0.06 to 0.31 dB/cm.
ACCESSION #
9818044

 

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