Formation of hydroxyl due to reaction of hydrogen with silica optical fiber preforms

Stone, J.; Wiesenfeld, J. M.; Marcuse, D.; Burrus, C. A.; Yang, S.
August 1985
Applied Physics Letters;8/1/1985, Vol. 47 Issue 3, p328
Academic Journal
We have studied the formation of hydroxyl in silica glass made by the modified chemical vapor deposition process and exposed to hydrogen at 900 °C. The spatial hydroxyl concentration profiles have been measured as a function of exposure time. The observations are explained by a theoretical model involving diffusion of hydrogen in the silica, and reaction with sites to form hydroxyl. The model assumes local equilibrium between hydrogen and hydroxyl, and the existence of a finite number of reaction sites which are consumed in the reaction.


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