TITLE

Role of mechanical stress in the light-induced degradation of hydrogenated amorphous silicon

AUTHOR(S)
Stutzmann, Martin
PUB. DATE
July 1985
SOURCE
Applied Physics Letters;7/1/1985, Vol. 47 Issue 1, p21
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
The correlation between the high intrinsic mechanical stresses in plasma-deposited hydrogenated amorphous silicon and the magnitude of the light-induced degradation in this material (Staebler–Wronski effect) has been studied for films with different thicknesses and for various substrate materials. The experimental results suggest that the creation of metastable defects occurs mainly in the strained region of the films near the substrate, and that the number of these states is roughly proportional to the total stress in a given sample.
ACCESSION #
9817769

 

Related Articles

Share

Read the Article

Courtesy of THE LIBRARY OF VIRGINIA

Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics