Reactions of XeF2 chemisorbed on Si(111) 7×7

Roop, B.; Joyce, S.; Schultz, Jocelyn C.; Shinn, N. D.; Steinfeld, J. I.
June 1985
Applied Physics Letters;6/15/1985, Vol. 46 Issue 12, p1187
Academic Journal
The stable overlayer composition resulting from dissociative chemisorption of XeF2 on the Si(111)7×7 surface has been studied by x-ray photoelectron spectroscopy and thermal desorption spectrometry. Evidence is found for the existence of fluorine covalently bonded in the bulk; no evidence for unreacted interstitial fluorine is found.


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