New flattening technique of iron garnet films by laser etching

Ando, Koji; Takeda, Norio; Koshizuka, Naoki
June 1985
Applied Physics Letters;6/1/1985, Vol. 46 Issue 11, p1107
Academic Journal
A new flattening technique was found through a study of the acceleration of the chemical etching process of iron garnet films by laser irradiation. The films on Gd3Ga5O12 substrates immersed in phosphoric acid were etched by irradiation with a laser beam of 581-nm wavelength. Regardless of the initial film thickness, the etching practically terminated when the thickness reached a certain magnitude. By using this phenomenon, we succeeded in flattening the film and integrating multiple different films on a single substrate.


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