TITLE

Second derivative internal photoemission spectroscopy for the study of interdiffusion and compound formation phenomena

AUTHOR(S)
Krawczyk, S. K.; Mrabeut, T.
PUB. DATE
May 1985
SOURCE
Applied Physics Letters;5/1/1985, Vol. 46 Issue 9, p837
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
In this letter a simple spectroscopic method for the study of interdiffusion and compound formation phenomena occurring between two metal layers deposited on the top of oxidized silicon wafer is developed. Using this method, the simultaneous presence of different metallic compounds at the interface with the insulator can be identified and their composition may be evaluated. Experimental results presented here have been obtained with the Al (150 Ã…)-Au (150 Ã…)-SiO[sub 2]-Si and Au (150 Ã…)-Al (150 Ã…)-SiO[sub 2]-Si systems.
ACCESSION #
9817509

 

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