Highly photoconductive and photosensitive hydrogenated amorphous silicon carbon alloy films prepared by magnetron sputtering

Saito, Nobuo
January 1985
Applied Physics Letters;Jan1985, Vol. 46 Issue 1, p61
Academic Journal
Undoped hydrogenated amorphous silicon carbon alloy thin films were prepared by the magnetron sputtering of silicon in a gas mixture of methane argon. It is found that the photoconductivities of the films with carbon concentration above 15% are one order of magnitude or more larger than the films prepared by the glow discharge decomposition of silane-methane gas mixture reported by other groups before now. Moreover, the photosensitivities of these films are larger than those of the glow discharge films, as a result of small dark conductivities of the former compared with those of the latter.


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