TITLE

Photoinduced diffusion of Ag in GexSe1-x glass

AUTHOR(S)
Leung, W.; Cheung, N.; Neureuther, A. R.
PUB. DATE
March 1985
SOURCE
Applied Physics Letters;3/15/1985, Vol. 46 Issue 6, p543
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Diffusion of Ag in GexSe1-x (x∼0.1) under UV light irradiation is studied using Rutherford backscattering spectrometry and microlithography techniques. The diffusion coefficient at 21 °C and 2 mW/cm2 is determined to be 2.7 nm2/s. The temperature dependence of the diffusivity follows an Arrhenius-type equation with an activation energy of 5.32 kcal/mole (0.23 eV) and a pre-exponent factor of 2.5×104 nm2/s. The reciprocity of irradiation intensity and exposure time with respect to the diffusion distance is confirmed. Specifically, the diffusivity is found to be directly proportional to the irradiation intensity.
ACCESSION #
9817287

 

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