Spectral sensitivity of resist by x-ray excited ion mass analysis

Mochiji, Kozo; Kimura, Takeshi; Obayashi, Hidehito
February 1985
Applied Physics Letters;2/15/1985, Vol. 46 Issue 4, p387
Academic Journal
A measurement technique of spectral sensitivity for x-ray resist is developed. Sensitivity is evaluated from the yield of gaseous fragment of resist during exposure to monochromatized synchrotron radiation. Using this technique named x-ray excited ion mass analysis, the spectral sensitivity of x-ray resist, poly-2-methylpentene-1-sulfone, is evaluated. The sensitivity is found to be enhanced at shorter wavelengths despite a low absorption coefficient. This measurement technique promises to improve the spectral sensitivity analysis in the soft x-ray region.


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