TITLE

Mass spectrometry sampling method for characterizing high-density plasma etching mechanisms

AUTHOR(S)
Eddy, C. R.; Leonhardt, D.; Shamamian, V. A.; Butler, J. E.; Thoms, B. D.
PUB. DATE
May 2003
SOURCE
Applied Physics Letters;5/26/2003, Vol. 82 Issue 21, p3626
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Mass spectrometry sampling using a "through-the-platen" technique is described with respect to its utility in characterizing high-density plasma etching processes for semiconductors. A custom substrate platen/sampling aperture is described and its effectiveness in characterizing plasma/surface reactions is demonstrated. The technique is applied to the characterization of GaAs etching in a Cl[sub 2]/Ar high-density plasma chemistry.
ACCESSION #
9815700

 

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