TITLE

Plasma potentials and performance of the advanced electron cyclotron resonance ion source

AUTHOR(S)
Xie, Z. Q.; Lyneis, C. M.
PUB. DATE
September 1994
SOURCE
Review of Scientific Instruments;Sep94, Vol. 65 Issue 9, p2947
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
The mean plasma potential was measured on the LBL advanced electron cyclotron resonance (AECR) ion source for a variety of conditions. The mean potentials for plasmas of oxygen, argon, and argon mixed with oxygen in the AECR were determined. These plasma potentials are positive with respect to the plasma chamber wall and are on the order of tens of volts. Electrons injected into the plasma by an electron gun or from an aluminum oxide wall coating with a very high secondary electron emission reduce the plasma potential as does gas mixing. A lower plasma potential in the AECR source coincides with enhanced production of high charged state ions indicating longer ion confinement times. The effect of the extra electrons from external injection or wall coatings is to lower the average plasma potential and to increase the n[sub e] Ï„[sub i] of the ECR plasma. With sufficient extra electrons, the need for gas mixing can be eliminated or reduced to a lower level, so the source can operate at lower neutral pressures. A reduction of the neutral pressure decreases charge exchange between ions and neutrals and enhances the production of high charge state ions. An aluminum oxide coating results in the lowest plasma potential among the three methods discussed and the best source performance.
ACCESSION #
9787662

 

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