TITLE

KLA-Tencor Launches Photomask Verification System

PUB. DATE
May 2003
SOURCE
Electronic News;5/12/2003, Vol. 49 Issue 19, pN.PAG
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Reports on the introduction of the Process Window Qualification (PWQ) reticle design verification system from KLA-Tencor. Functions of the PWQ; Statement from Burn Lin of Taiwan Semiconductor Manufacturing Co. about the extension of the optical lithography to the 90 nanometer node; Key features of the PWQ.
ACCESSION #
9769855

 

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