TITLE

Direct fabrication of nanowires in an electron microscope

AUTHOR(S)
Silvis-Cividjian, N.; Hagen, C. W.; Kruit, P.; v.d. Stam, M. A. J.; Groen, H. B.
PUB. DATE
May 2003
SOURCE
Applied Physics Letters;5/19/2003, Vol. 82 Issue 20, p3514
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Electron-beam-induced deposition (EBID) is a potentially fast and resistless deposition technique which might overcome the fundamental resolution limits of conventional electron-beam lithography. We advance the understanding of the EBID process by simulating the structure growth. The merit of our model is that it explains the shapes of structures grown by EBID quantitatively. It also predicts the possibility to directly fabricate structures with lateral sizes smaller than 10 nm and points out the ideal conditions to achieve this goal. We verify these predictions by fabricating sub-10-nm lines and dots in a state-of-the-art scanning transmission electron microscope.
ACCESSION #
9741825

 

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