TITLE

Passivation effect of silicon nitride against copper diffusion

AUTHOR(S)
Miyazaki, Hiroshi; Kojima, Hisao
PUB. DATE
June 1997
SOURCE
Journal of Applied Physics;6/15/1997, Vol. 81 Issue 12, p7746
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Evaluates the passivation effect of plasma-enhanced chemical-vapor-deposited silicon nitride using secondary ion mass spectrometry and atomic absorption spectrometry. Detection of copper contamination; Use of copper in ultralarge scale integrated conductors; Effect of copper contamination on time-dependent dielectric breakdown.
ACCESSION #
9709226106

 

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