Transport properties of LaTiO[sub 3+x] films and heterostructures

Schmehl, A.; Lichtenberg, F.; Bielefeldt, H.; Mannhart, J.; Schlom, D. G.
May 2003
Applied Physics Letters;5/5/2003, Vol. 82 Issue 18, p3077
Academic Journal
We report on the transport properties of LaTiO[sub 3 + ε and LaTiO[sub 3.5] films. The LaTiO[sub 3 +ε] samples show metallic transport and several samples exhibit a hysteretic drop of resistance during cooldown at ∼240 K. The ferroelectric LaTiO[sub 3.5] samples, grown in capacitor structures, have nonlinear, diode-like and hysteretic V(I) characteristics. Two charge-controlled transport regimes are found, which can be utilized for switching the devices between two voltage states.


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