France Telecom, SGS in move to 0.25-micron

November 1996
Electronic News;11/25/96, Vol. 42 Issue 2144, p18
Trade Publication
Reports that France Telecom-CNET and SGS-Thomson Microelectronics have already processed first wafers using a 0.25-micron drawn CMOS process and 0.20-micron effective gate length. Utilization of the process to manufacture integrated circuits for high-speed applications; Remarks from SGS-Thomson corporate vice-president of research and development Joel Monnier.


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