Monitoring plasma damage: A real-time, noncontact approach

Hoff, A.M.; Esry, T.C.
July 1996
Solid State Technology;Jul96, Vol. 39 Issue 7, p139
Trade Publication
Reports on the results obtained while using a new monitoring approach for real-time and noncontact diagnostics of plasma damage at two independent semiconductor wafer-fab locations. Generation of whole-wafer maps; Modes of plasma damage; Measuring charge effects; Surface photovoltage measurement.


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