TITLE

Molecular beam epitaxy growth of GaAs[sub 1-x]Bi[sub x]

AUTHOR(S)
Tixier, S.; Adamcyk, M.; Tiedje, T.; Francoeur, S.; Mascarenhas, A.; Wei, Peng; Schiettekatte, F.
PUB. DATE
April 2003
SOURCE
Applied Physics Letters;4/7/2003, Vol. 82 Issue 14, p2245
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
GaAs[sub 1-x]Bi[sub x] epilayers with bismuth concentrations up to x=3.1% were grown on GaAs by molecular beam epitaxy. The Bi content in the films was measured by Rutherford backscattering spectroscopy. X-ray diffraction shows that GaAsBi is pseudomorphically strained to GaAs but that some structural disorder is present in the thick films. The extrapolation of the lattice constant of GaAsBi to the hypothetical zincblende GaBi alloy gives 6.33±0.06Å. Room-temperature photoluminescence of the GaAsBi epilayers is obtained and a significant redshift in the emission of GaAsBi of ∼84 meV per percent Bi is observed.
ACCESSION #
9428288

 

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