TITLE

Fabrication of three-dimensional polymer photonic crystal structures using single diffraction element interference lithography

AUTHOR(S)
Divliansky, Ivan; Mayer, Theresa S.; Holliday, Kito S.; Crespi, Vincent H.
PUB. DATE
March 2003
SOURCE
Applied Physics Letters;3/17/2003, Vol. 82 Issue 11, p1667
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
This letter describes an approach for recording three-dimensional (3D) periodic structures in a photosensitive polymer using a single diffraction element mask. The mask has a central opening surrounded by three diffraction gratings oriented 120° relative to one another such that the three first order diffracted beams and the nondiffracted laser beam give a 3D spatial light intensity pattern. Structures patterned in this polymer using 1.0 and 0.56 μm grating periods have hexagonal symmetry with micron- to submicron-periodicity over large substrate area. Band structure calculations of these low index contrast materials predict photonic gaps in certain high symmetry directions.
ACCESSION #
9275615

 

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