TITLE

Characteristics of AlN/GaN nanowire Bragg mirror grown on (001) silicon by molecular beam epitaxy

AUTHOR(S)
Heo, Junseok; Zhou, Zifan; Guo, Wei; Ooi, Boon S.; Bhattacharya, Pallab
PUB. DATE
October 2013
SOURCE
Applied Physics Letters;10/28/2013, Vol. 103 Issue 18, p181102
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
GaN nanowires containing AlN/GaN distributed Bragg reflector (DBR) heterostructures have been grown on (001) silicon substrate by molecular beam epitaxy. A peak reflectance of 70% with normal incidence at 560 nm is derived from angle resolved reflectance measurements on the as-grown nanowire DBR array. The measured peak reflectance wavelength is significantly blue-shifted from the ideal calculated value. The discrepancy is explained by investigating the reflectance of the nanoscale DBRs with a finite difference time domain technique. Ensemble nanowire microcavities with In0.3Ga0.7N nanowires clad by AlN/GaN DBRs have also been characterized. Room temperature emission from the microcavity exhibits considerable linewidth narrowing compared to that measured for unclad In0.3Ga0.7N nanowires. The resonant emission is characterized by a peak wavelength and linewidth of 575 nm and 39 nm, respectively.
ACCESSION #
92706481

 

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