TITLE

Raman-spectroscopic determination of inhomogeneous stress in submicron silicon devices

AUTHOR(S)
Dietrich, B.; Bukalo, V.; Fischer, A.; Dombrowski, K. F.; Bugiel, E.; Kuck, B.; Richter, H. H.
PUB. DATE
February 2003
SOURCE
Applied Physics Letters;2/24/2003, Vol. 82 Issue 8, p1176
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
We present the deconvolution of measurements of inhomogeneous mechanical stress in silicon device structures obtained by UV micro-Raman spectroscopy. Due to the very small UV penetration depth of only 12 nm, averaging of stress over the depth is almost eliminated. Only the averaging of stress over the area of the laser spot remains. By deconvolution of the spectra and comparison with finite element simulations, it is now possible to extract information on mechanical stress from areas as small as 200 nm. Oppositely stressed regions in submicroscopic dimensions can be detected, which could not be detected in previous visible light measurements due to averaging.
ACCESSION #
9140768

 

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