Photomodulated thermoreflectance investigation at elevated temperatures: plasma versus thermal effect

Christofides, Constantinos; Othonos, Andreas; Loizidou, Efi
February 2003
Applied Physics Letters;2/17/2003, Vol. 82 Issue 7, p1132
Academic Journal
Photomodulated thermoreflectance measurements were performed at elevated temperatures (294 to 623 K), on crystalline silicon lightly doped with boron. The temperature dependence is qualitatively and quantitatively discussed. The "competition" between thermal and plasma contribution, as a function of temperature, is one of the main subjects of this letter.


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