TITLE

Parameters that control pulsed electron beam ablation of materials and film deposition processes

AUTHOR(S)
Strikovski, Mikhail; Harshavardhan, K. S.
PUB. DATE
February 2003
SOURCE
Applied Physics Letters;2/10/2003, Vol. 82 Issue 6, p853
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Conditions for ablation of materials and film deposition were analyzed for a pulsed (∼100 ns) electron beam produced by a channel-spark source. For dielectric materials, we found the existence of an optimal source voltage related to the saturation of the pulse current. Our analysis indicates a larger ablated mass, smaller optimal deposition rates (∼0.25 Å/pulse), and a larger optimal target to substrate distance relative to pulsed laser deposition process.
ACCESSION #
9036518

 

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