TITLE

The investigation of physicochemical processes of silica glass doping with fluorine by the MCVD method

AUTHOR(S)
Eron'yan, M.
PUB. DATE
May 2013
SOURCE
Glass Physics & Chemistry;May2013, Vol. 39 Issue 3, p279
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
The temperature-time dependences for sintering and fluorination processes of SiO nanoparticles obtained by the method of chemical vapor deposition are presented. It has been revealed that at the SiF pressure of 1 atm, the intensive agglomeration of high-dispersive layers prevents the achievement of equilibrium between the fluorine-containing gas media and the condensed phase. The saturation of the porous layers with fluorine occurs at temperatures less than 1100°C, when the sintering duration of high-dispersive particles is substantially longer than the fluorination process time.
ACCESSION #
88227733

 

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