Correlation of plume dynamics and oxygen pressure with VO stoichiometry during pulsed laser deposition

Lafane, S.; Kerdja, T.; Abdelli-Messaci, S.; Khereddine, Y.; Kechouane, M.; Nemraoui, O.
July 2013
Applied Physics A: Materials Science & Processing;Jul2013, Vol. 112 Issue 1, p159
Academic Journal
Vanadium dioxide thin films have been deposited on Corning glass substrates by a KrF laser ablation of VO target at the laser fluence of 2 J cm. The substrate temperature and the target-substrate distance were set to 500 C and 4 cm, respectively. X-ray diffraction analysis showed that pure VO is only obtained at an oxygen pressure range of 4×10-2×10 mbar. A higher optical switching contrast was obtained for the VO films deposited at 4×10-10 mbar. The films properties were correlated to the plume-oxygen gas interaction monitored by fast imaging of the plume.


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