Plasma doping and reduced crystalline damage for conformally doped fin field effect transistors

Woo Lee, Jae; Sasaki, Yuichiro; Ju Cho, Moon; Togo, Mitsuhiro; Boccardi, Guillaume; Ritzenthaler, Romain; Eneman, Geert; Chiarella, Thomas; Brus, Stephan; Horiguchi, Naoto; Groeseneken, Guido; Thean, Aaron
June 2013
Applied Physics Letters;6/3/2013, Vol. 102 Issue 22, p223508
Academic Journal
Low frequency noise and hot carrier reliability analysis of the plasma doping scheme are investigated for advanced fin field effect transistor (FinFET) conformal doping. Plasma doping improves device performances and hot carrier reliability for both fin resistors and FinFETs due to the absence of crystalline damage for narrow fins. One decade lower noise level and Coulomb scattering coefficient related to the crystalline damage suppression are observed for the plasma doping compared to the standard ion-implantation.


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