Optimization of graphene dry etching conditions via combined microscopic and spectroscopic analysis

Prado, Mariana C.; Jariwala, Deep; Marks, Tobin J.; Hersam, Mark C.
May 2013
Applied Physics Letters;5/13/2013, Vol. 102 Issue 19, p193111
Academic Journal
Single-layer graphene structures and devices are commonly defined using reactive ion etching and plasma etching with O2 or Ar as the gaseous etchants. Although optical microscopy and Raman spectroscopy are widely used to determine the appropriate duration of dry etching, additional characterization with atomic force microscopy (AFM) reveals that residual graphene and/or etching byproducts persist beyond the point where the aforementioned methods suggest complete graphene etching. Recognizing that incomplete etching may have deleterious effects on devices and/or downstream processing, AFM characterization is used here to determine optimal etching conditions that eliminate graphene dry etching residues.


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