Porosity effect on the dielectric constant and thermomechanical properties of organosilicate films

Liu, Junjun; Gan, Dongwen; Hu, Chuan; Kiene, Michael; Ho, Paul S.; Volksen, Willi; Miller, Robert D.
November 2002
Applied Physics Letters;11/25/2002, Vol. 81 Issue 22, p4180
Academic Journal
This letter reports a study of the porosity effect on material properties of methylsilsesquioxane films, including the dielectric constant, thermal conductivity, and thermal stress behavior. In a porosity range from 0% to 50%, both the dielectric constant and thermal conductivity decreased with increasing porosity and no significant change was observed at the percolation point where pores became interconnected. In comparison, the stress-temperature slope also decreased with porosity, but as the porosity approached the percolation point, the slope showed a large drop of 40%, indicating a significant degradation of the thermomechanical properties due to percolation of pores. Assuming the coefficients of thermal expansion remain at 17 ppm/°C within the porosity range, the change in the stress-temperature slope corresponds to a decrease of the biaxial modulus from 7 to 5 GPa around the percolation point.


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