TITLE

Optimization of the GaAs-on-Si Substrate for Microelectromechanical Systems (MEMS) Sensor Application

AUTHOR(S)
Yunbo Shi; Hao Guo; Haiqiao Ni; Chenyang Xue; Zhichuan Niu; Jun Tang; Jun Liu; Wendong Zhang; Jifang He; Mifeng Li; Ying Yu
PUB. DATE
December 2012
SOURCE
Materials (1996-1944);Dec2012, Vol. 5 Issue 12, p2917
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Resonant Tunneling Diodes (RTD) and High Electron Mobility Transistor (HEMT) based on GaAs, as the piezoresistive sensing element, exhibit extremely high sensitivity in the MEMS sensors based on GaAs. To further expand their applications to the fields of MEMS sensors based on Si, we have studied the optimization of the GaAs epitaxy layers on Si wafers. Matching superlattice and strain superlattice were used, and the surface defect density can be improved by two orders of magnitude. Combing with the Raman spectrum, the residual stress was characterized, and it can be concluded from the experimental results that the residual stress can be reduced by 50%, in comparison with the original substrate. This method gives us a solution to optimize the epitaxy GaAs layers on Si substrate, which will also optimize our future process of integration RTD and HEMT based on GaAs on Si substrate for the MEMS sensor applications.
ACCESSION #
84439905

 

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