Spatial distribution of Cu sputter ejected by very low energy ion bombardment

Doughty, C.; Gorbatkin, S.M.; Berry, L. A.
August 1997
Journal of Applied Physics;8/15/1997, Vol. 82 Issue 4, p1868
Academic Journal
Investigates the spatial distributions of copper atoms sputtered by He+, Ar+, and Xe+ ions incident. Ionized physical vapor deposition; Estimated forward directed resputtering; Total yield as a function of angle of incidence.


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