TITLE

Spatial distribution of Cu sputter ejected by very low energy ion bombardment

AUTHOR(S)
Doughty, C.; Gorbatkin, S.M.; Berry, L. A.
PUB. DATE
August 1997
SOURCE
Journal of Applied Physics;8/15/1997, Vol. 82 Issue 4, p1868
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Investigates the spatial distributions of copper atoms sputtered by He+, Ar+, and Xe+ ions incident. Ionized physical vapor deposition; Estimated forward directed resputtering; Total yield as a function of angle of incidence.
ACCESSION #
82997

 

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