The study of the thermal oxide films on silicon wafers by Fourier transform infrared attenuated total reflection spectroscopy

Nagasawa, Yoshikatsu; Yoshii, Ichirou; Naruke, Kiyomi; Yamamoto, Kazuhiko; Ishida, Hideyuki; Ishitani, Akira
August 1990
Journal of Applied Physics;8/15/1990, Vol. 68 Issue 4, p1429
Academic Journal
Presents a study that applied Fourier transform infrared attenuated total reflectance to measure silicon substrate contents in thermal oxide films grown on silicon wafers. Background on the effects of trapped charges in the oxide layer bulk; Analysis of infrared spectra; Results and implications.


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