Effect of ion energy on the optical and structural properties of SiO2 grown by plasma-enhanced chemical-vapor deposition

Durandet, A.; McKenzie, D. R.
October 1996
Journal of Applied Physics;10/15/1996, Vol. 80 Issue 8, p4707
Academic Journal
Presents information on a study that investigated the optical and structural SiO[sub2] films as a function of the energy of the ion bombardment applied during plasma-enhanced chemical-vapor deposition. Experimental procedure; Results and discussion on the study; Conclusions.


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