TITLE

Effect of ion energy on the optical and structural properties of SiO2 grown by plasma-enhanced chemical-vapor deposition

AUTHOR(S)
Durandet, A.; McKenzie, D. R.
PUB. DATE
October 1996
SOURCE
Journal of Applied Physics;10/15/1996, Vol. 80 Issue 8, p4707
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Presents information on a study that investigated the optical and structural SiO[sub2] films as a function of the energy of the ion bombardment applied during plasma-enhanced chemical-vapor deposition. Experimental procedure; Results and discussion on the study; Conclusions.
ACCESSION #
7663842

 

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