TITLE

Structural changes of silicon dioxide films caused by synchrotron irradiation

AUTHOR(S)
Park, Young-Bae; Rhee, Shi-Woo; Imaizumi, Y.; Urisu, T.
PUB. DATE
July 1996
SOURCE
Journal of Applied Physics;7/15/1996, Vol. 80 Issue 2, p1236
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Deals with a study which investigated the effect of synchrotron radiation on silicon oxide films deposited with remote plasma-enhanced chemical-vapor deposition. Application in chemical vapor deposition; Beam line used for the study; Conclusion.
ACCESSION #
7662468

 

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