Remote hydrogen plasma chemical vapor deposition using an organopentasilane cluster as a novel film-forming precursor: Mechanism of the activation step

Wrobel, A. M.; Wickramanayaka, S.; Hatanaka, Y.
July 1994
Journal of Applied Physics;7/1/1994, Vol. 76 Issue 1, p558
Academic Journal
Presents a study which examined the remote hydrogen plasma chemical vapor deposition using tetrakis(trimethylsilyl)silane as a source compound. Experiment details; Results and discussion; Conclusions.


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