TITLE

Infrared-absorption spectroscopy of Si(100) and Si(111) surfaces after chemomechanical polishing

AUTHOR(S)
Pietsch, G. J.; Chabal, Y. J.; Higashi, G. S.
PUB. DATE
August 1995
SOURCE
Journal of Applied Physics;8/1/1995, Vol. 78 Issue 3, p1650
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Discusses the mechanism of silicon stock removal in chemomechanical polishing by characterizing surface chemical species with infrared-absorption measurements. Overview of spectroscopic characterization of surface morphologies; Dependence of the stock removal rate and contact angle on the solution potential of hydrogen ions; Removal rate and degree of hydrophobicity.
ACCESSION #
7658492

 

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