TITLE

Effects of plasma and/or 193 nm excimer-laser irradiation in chemical-vapor deposition of boron films from B2H6+He

AUTHOR(S)
Komatsu, Shojiro; Kasamatsu, Mitsuo; Yamada, Kawakatsu; Moriyoshi, Yusuke
PUB. DATE
June 1992
SOURCE
Journal of Applied Physics;6/1/1992, Vol. 71 Issue 11, p5654
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Presents a study which examined the effects of plasma and/or excimer laser irradiation in chemical vapor deposition of boron films from boron[sub2]hydrogen[sub6]+helium. Experimental procedure; Results and discussion; Precursors predicted by modified neglect of diatomic overlap calculations.
ACCESSION #
7656524

 

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