Optical characteristics of SiO2 formed by plasma-enhanced chemical-vapor deposition of tetraethoxysilane

Ishii, Keisuke; Ohki, Yoshimichi; Nishikawa, Hiroyuki
November 1994
Journal of Applied Physics;11/1/1994, Vol. 76 Issue 9, p5418
Academic Journal
Focuses on a study on the optical characteristics of thin silicon oxide films deposited from tetraethoxysilane by the plasma-enhanced chemical-vapor-deposition method. Use of synchroton radiation in the study; Analysis of the optical-absorption spectra in the vacuum ultraviolet region; Results and discussion.


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