A soft-x-ray-emission investigation of cobalt implanted silicon crystals

Jia, J. J.; Callcott, T. A.; O’Brien, W. L.; Dong, Q. Y.; Mueller, D. R.; Rubensson, J-E.; Ederer, D. L.; Tan, Z.; Namavar, F.; Budnick, J. I.
June 1991
Journal of Applied Physics;6/1/1991, Vol. 69 Issue 11, p7800
Academic Journal
Examines the silicon L[sub 2, 3] emission spectra of silicon crystals implanted with cobalt at certain doses through the use of soft-x-ray-emission spectroscopy. Comparison between metal silicides by ion implantation and those produced from solid-state reaction of deposited layers; Limitations of methods for implanted systems; Characteristics of cobalt-implantation.


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