TITLE

Deposition of aluminum thin films by photochemical surface reaction

AUTHOR(S)
Hanabusa, Mitsugu; Oikawa, Akira; Cai, Peng Ying
PUB. DATE
October 1989
SOURCE
Journal of Applied Physics;10/1/1989, Vol. 66 Issue 7, p3268
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Focuses on a study that described the deposition of aluminum thin films from dimethylaluminum hydride on silicon substrates illuminated with a deuterium map or an argon fluoride laser. Source gases for photodeposition of aluminum films; Experimental arrangements used for photochemical vapor deposition of aluminum thin films; Dependence of deposition rate on substrate temperature under irradiation of the deuterium lamp and the argon fluoride laser.
ACCESSION #
7649295

 

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