TITLE

Excimer laser photolysis study of NH3 and SO2 mixtures at 193 nm

AUTHOR(S)
Ikeda, Tetsuya; Danno, Minoru; Makihara, Hiroshi
PUB. DATE
October 1989
SOURCE
Journal of Applied Physics;10/1/1989, Vol. 66 Issue 7, p3404
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Presents a study that examined photolysis in the NH[sub3]-SO[sub2] system by using argon fluoride excimer laser. Construction of the photolysis cell; Expression for the photolysis of the mixtures due to the argon fluoride excimer laser radiation; Reaction which takes place indicated by the decomposition of silicon oxide due to the NH[sub3] photolysis.
ACCESSION #
7649273

 

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